Kniha momentálne nie je na sklade![](/images/blank-book/blank-book.1920.jpg)
![](/images/blank-book/blank-book.1920.jpg)
Viac o knihe
Focusing on the physics and materials science, this book delves into ion implantation and ion beam modification, crucial for silicon integrated circuit technology. It discusses the intricacies of ion-solid interactions, predicting ion ranges, and addressing lattice disorder. The text covers essential processes like shallow-junction formation and the innovative use of hydrogen ion beams for silicon slicing. Additionally, it explores topics such as ion-beam mixing, stresses, and sputtering, highlighting their significance in enhancing materials properties and performance.
Nákup knihy
Ion Implantation and Synthesis of Materials, James W. Mayer, Michael Nastasi
- Jazyk
- Rok vydania
- 2010
- product-detail.submit-box.info.binding
- (mäkká)
Akonáhle sa objaví, pošleme vám e-mail.
Doručenie
Platobné metódy
Navrhnúť zmenu
- Titul
- Ion Implantation and Synthesis of Materials
- Jazyk
- anglicky
- Autori
- James W. Mayer, Michael Nastasi
- Vydavateľ
- Springer Berlin Heidelberg
- Rok vydania
- 2010
- Väzba
- mäkká
- Počet strán
- 280
- ISBN13
- 9783642062599
- Kategórie
- Príroda všeobecne
- Anotácia
- Focusing on the physics and materials science, this book delves into ion implantation and ion beam modification, crucial for silicon integrated circuit technology. It discusses the intricacies of ion-solid interactions, predicting ion ranges, and addressing lattice disorder. The text covers essential processes like shallow-junction formation and the innovative use of hydrogen ion beams for silicon slicing. Additionally, it explores topics such as ion-beam mixing, stresses, and sputtering, highlighting their significance in enhancing materials properties and performance.