Kniha momentálne nie je na sklade![](/images/blank-book/blank-book.1920.jpg)
![](/images/blank-book/blank-book.1920.jpg)
Viac o knihe
Focusing on the physics and materials science, this book delves into ion implantation and ion beam modification, essential in silicon integrated circuit technology. It explores critical processes like controlled doping, ion-solid interactions, and shallow-junction formation. The text also addresses practical applications such as improving corrosion resistance and surface hardening. Key topics include ion ranges, lattice disorder, ion-beam mixing, and stresses, providing a comprehensive understanding of how ion implantation enhances materials properties.
Nákup knihy
Ion Implantation and Synthesis of Materials, James W. Mayer, Michael Nastasi
- Jazyk
- Rok vydania
- 2006
- product-detail.submit-box.info.binding
- (pevná)
Akonáhle sa objaví, pošleme vám e-mail.
Doručenie
Platobné metódy
Navrhnúť zmenu
- Titul
- Ion Implantation and Synthesis of Materials
- Jazyk
- anglicky
- Autori
- James W. Mayer, Michael Nastasi
- Vydavateľ
- Springer Berlin Heidelberg
- Rok vydania
- 2006
- Väzba
- pevná
- Počet strán
- 280
- ISBN13
- 9783540236740
- Kategórie
- Príroda všeobecne
- Anotácia
- Focusing on the physics and materials science, this book delves into ion implantation and ion beam modification, essential in silicon integrated circuit technology. It explores critical processes like controlled doping, ion-solid interactions, and shallow-junction formation. The text also addresses practical applications such as improving corrosion resistance and surface hardening. Key topics include ion ranges, lattice disorder, ion-beam mixing, and stresses, providing a comprehensive understanding of how ion implantation enhances materials properties.