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Ion Implantation and Synthesis of Materials

Parametre

Počet strán
280 stránok
Čas čítania
10 hodin

Viac o knihe

Focusing on the physics and materials science, this book delves into ion implantation and ion beam modification, essential in silicon integrated circuit technology. It explores critical processes like controlled doping, ion-solid interactions, and shallow-junction formation. The text also addresses practical applications such as improving corrosion resistance and surface hardening. Key topics include ion ranges, lattice disorder, ion-beam mixing, and stresses, providing a comprehensive understanding of how ion implantation enhances materials properties.

Vydanie

Nákup knihy

Ion Implantation and Synthesis of Materials, James W. Mayer, Michael Nastasi

Jazyk
Rok vydania
2006
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